by Anayee, Mark, Shuck, Christopher E., Shekhirev, Mikhail, Goad, Adam, Wang, Ruocun and Gogotsi, Yury
Reference:
M. Anayee, C. E. Shuck, M. Shekhirev, A. Goad, R. Wang, and Y. Gogotsi, "Kinetics of Ti3AlC2 Etching for Ti3C2Tx MXene Synthesis", Chemistry of Materials, 2022.
Bibtex Entry:
@article{824,
   author = {Anayee, Mark and Shuck, Christopher E. and Shekhirev, Mikhail and Goad, Adam and Wang, Ruocun and Gogotsi, Yury},
   title = {Kinetics of Ti3AlC2 Etching for Ti3C2Tx MXene Synthesis},
   journal = {Chemistry of Materials},
   DOI = {https://doi.org/10.1021/acs.chemmater.2c02194},
   year = {2022},
   type = {Journal Article},
   pdf = https://nano.materials.drexel.edu/wp-content/papercite-data/pdf/824.pdf
}

Kinetics of Ti3AlC2 Etching for Ti3C2Tx MXene Synthesis