by Kim, Yong-Jae, Kim, Seon Joon, Seo, Darae, Chae, Yoonjeong, Anayee, Mark, Lee, Yonghee, Gogotsi, Yury, Ahn, Chi Won and Jung, Hee-Tae
Reference:
Y. Kim, S. J. Kim, D. Seo, Y. Chae, M. Anayee, Y. Lee, Y. Gogotsi, C. W. Ahn, and H. Jung, "Etching Mechanism of Monoatomic Aluminum Layers during MXene Synthesis", Chemistry of Materials, vol. 33, 2021, pp. 6346-6355.
Bibtex Entry:
@article{776,
author = {Kim, Yong-Jae and Kim, Seon Joon and Seo, Darae and Chae, Yoonjeong and Anayee, Mark and Lee, Yonghee and Gogotsi, Yury and Ahn, Chi Won and Jung, Hee-Tae},
title = {Etching Mechanism of Monoatomic Aluminum Layers during MXene Synthesis},
journal = {Chemistry of Materials},
volume = {33},
issue = {16},
pages = {6346-6355},
ISSN = {0897-4756},
DOI = {https://doi.org/10.1021/acs.chemmater.1c01263},
year = {2021},
date = {08/12},
type = {Journal Article},
url = https://nano.materials.drexel.edu/wp-content/papercite-data/pdf/776.pdf
}
Etching Mechanism of Monoatomic Aluminum Layers during MXene Synthesis
