by Gogotsi, Y., Baek, C. and Kirscht, F.
Reference:
Raman microspectroscopy study of processing-induced phase transformations and residual stress in silicon (Gogotsi, Y., Baek, C. and Kirscht, F.), In Semiconductor Science and Technology, volume 14, 1999.
Bibtex Entry:
@article{38,
author = {Gogotsi, Y. and Baek, C. and Kirscht, F.},
title = {Raman microspectroscopy study of processing-induced phase transformations and residual stress in silicon},
journal = {Semiconductor Science and Technology},
volume = {14},
number = {10},
pages = {936},
ISSN = {0268-1242},
DOI = {10.1088/0268-1242/14/10/310},
year = {1999},
date= {10/01}
type = {Journal Article}
}
Raman microspectroscopy study of processing-induced phase transformations and residual stress in silicon
