by Senthilnathan, J., Weng, C. C., Tsai, W. T., Gogotsi, Y. and Yoshimura, M.
Reference:
J. Senthilnathan, C. C. Weng, W. T. Tsai, Y. Gogotsi, and M. Yoshimura, "Synthesis of carbon films by electrochemical etching of SIC with hydrofluoric acid in nonaqueous solvents", Carbon, vol. 71, 2014, pp. 181.
Bibtex Entry:
@article{354,
author = {Senthilnathan, J. and Weng, C. C. and Tsai, W. T. and Gogotsi, Y. and Yoshimura, M.},
title = {Synthesis of carbon films by electrochemical etching of SIC with hydrofluoric acid in nonaqueous solvents},
journal = {Carbon},
volume = {71},
pages = {181},
ISSN = {0008-6223},
DOI = {10.1016/j.carbon.2014.01.028},
year = {2014},
date= {05/01}
type = {Journal Article},
url = https://nano.materials.drexel.edu/wp-content/papercite-data/pdf/354.pdf
}
Synthesis of carbon films by electrochemical etching of SIC with hydrofluoric acid in nonaqueous solvents
